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  您的位置: 首页 >> Headway Research(美国) (共1件商品,这是第1-1件)


http://www.headwayresearch.com/

美国 Headway Research 公司,成立于1964年,专业生产旋涂仪。

Headway Research, Inc. has been doing business worldwide since 1964. Headway has contributed many "firsts" in the technology of producing micro-electronic devices. A few firsts:

1964

First high acceleration spin coater.
First Spin coater with electronic speed rotation.
First vacuum-to-chuck interlock, first quick braking.
 
1966

First successful pump for photoresist.
First commercial spin developer for photoresist.
First mechanical scrubber for substrate surfaces.
 
1973

First Automated surface scrubber using polishing cloth technique.
 
1975

Developed first large substrate spinner for 14" diameter glass master discs for laser disc research.
 
1977

Initiated successful edge rounding of semiconductor substrates in the United States. Increased IC yields by 25%.
 
1985

Introduced "Inhibited Drying Spin Coating" techniques for improved coatings, especially on rectangular or odd-shaped substrates.
 
1990

Improved scrubbing techniques for large and rectangular substrates, using small disposable polishing cloth discs.

1998

New PWM32 Spin controller for low cost R & D use.
New HDP98 High purity fluid dispenser.
New Substrate lifter/alignment system.
 

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Headway Research, Inc. 产品目录

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